diff options
| author | Sylwester Nawrocki <[email protected]> | 2012-04-09 14:51:49 -0300 |
|---|---|---|
| committer | Mauro Carvalho Chehab <[email protected]> | 2012-05-14 14:34:18 -0300 |
| commit | 50d3f93e39d86d57af5df5f06c5b18ffe25ece79 (patch) | |
| tree | da68d9bd274ad0f82ac870bbe1c4da77501e2ed9 /lib/mpi/mpiutil.c | |
| parent | efcb07c1bbd43846aff192f28ad755fc8c93ad81 (diff) | |
[media] m5mols: Add exposure metering control
This patch adds V4L2_CID_EXPOSURE_METERING control which allows
to select the light metering mode for automatic exposure as one
of the following modes: spot (small area at the frame center),
center weighted and frame averaged.
Signed-off-by: Sylwester Nawrocki <[email protected]>
Signed-off-by: Kyungmin Park <[email protected]>
Signed-off-by: Mauro Carvalho Chehab <[email protected]>
Diffstat (limited to 'lib/mpi/mpiutil.c')
0 files changed, 0 insertions, 0 deletions